Table Top Sputtering System

  • Two Target DC Sputtering System
  • Confocal Sputter configuration
  • Suitable for co-deposition as well as sequential deposition
  • Compact foot print for better utilization of available space
  • Manual, semi-automatic or fully automatic mode

System Features

Process Chamber

  • Turbo Molecular pump based high vacuum pumping system
  • Base pressure: 10-7 torr by using suitable capacity turbo molecular pump
  • Electro-polished process chamber from inner and outer side for better vacuum performance
  • Extra ports for future up-gradation as per user requirement

Sputtering sources

  • RF/DC/Pulsed DC compatible sputtering sources
  • Manual or motorised shutter assembly
  • Available sizes 1”, 2”, 3”
  • High strength magnets for better performance

Substrate Holder & Heaters

  • Substrate holder to hold various sizes of substrate upto 4” dia.
  • Variable substrate rotation upto 30 rpm
  • Uniform substrate heating upto 600 Deg C are available

Gas Management

  • Mass flow control base gas management system with digital display and controller

Power Supply

  • RF Power supply with auto matching network
  • DC/ Pulsed DC
  • Assymetric Bi-polar Pulsed DC Power supply


  • R&D sputtering application
  • Optical coating
  • MEMS and Nano technology
  • Photovoltaic coating
  • Metals, metal oxides and dielectric coatings
  • Decorative coatings
  • Tool coatings