Pulsed Laser Deposition
Pulsed Laser Deposition (PLD) is a highly precise thin-film deposition technique in which high-energy laser pulses ablate a solid target material, generating a plasma plume that deposits onto a heated substrate. PLD is widely recognized for its excellent stoichiometric transfer, making it especially suitable for complex and multi-component materials.
Advanced Process Technology Pvt. Ltd. (APT) designs and manufactures state-of-the-art PLD systems for research and advanced material development, offering high flexibility, reliability, and process control.
System Features
- Excimer and Nd:YAG laser compatibility for a wide range of materials
- Rotating multi-target carousel for sequential or multilayer deposition
- High-temperature substrate heater up to 900 °C
- Adjustable ambient gas pressure for precise film growth control
- Substrate rotation for thickness and compositional uniformity
- Optional RHEED / in-situ diagnostics for real-time film monitoring
- High-vacuum stainless steel chamber optimized for laser ablation
Advantages
- Superior stoichiometric transfer from target to film
- Ideal for complex oxides and functional materials
- Excellent control over film thickness and microstructure
- Suitable for nanostructured and epitaxial film growth
- Flexible platform for research and process development
Typical Applications
- Complex oxide thin films
- High-temperature superconductors (HTS)
- Ferroelectric and multiferroic materials
- Nanostructured and functional coatings
- Advanced materials research and development
Typical Specifications
| Parameter | Specification |
| Deposition Method | Laser Ablation |
| Laser Type | Excimer / Nd:YAG |
| Laser Wavelength | 248 nm / 266 nm |
| Pulse Energy | Up to 500 mJ |
| Repetition Rate | 1 – 20 Hz |
| Base Pressure | ≤ 1 × 10⁻⁶ Torr |
| Process Pressure | 1 × 10⁻⁶ to 1 × 10⁻¹ Torr |
| Target Carousel | 3 – 6 targets |
| Substrate Heating | Ambient to 900 °C |
| Substrate Rotation | Provided |
| Applications | Oxides, superconductors, research films |
System Configuration & Options
- Choice of Excimer or Nd:YAG laser
- Motorized target and substrate rotation
- Automated pressure and temperature control
- Optional RHEED / in-situ process monitoring
- Custom chamber sizes and substrate holders
