High-Purity Sputtering Targets You Can Trust
Power your thin-film processes with high-purity sputtering targets engineered for stable plasma, uniform films, and long target life. We supply 3N–5N purity targets to customers in semiconductor, display, solar, optical coating, and advanced R&D industries worldwide.
From standard metals to custom alloys and ceramics, our targets deliver consistent deposition performance—batch after batch.
Why Customers Choose Us
- Ultra-high purity (up to 99.999%) for critical thin-film applications
- High-density targets for reduced arcing and particle generation
- Tight process control for repeatable film quality
- Custom sizes & compositions to match your sputtering system
- Cleanroom-grade packaging with full CoA and traceability
Materials We Supply
- Metals: Pure elemental targets across a wide range of atomic numbers like Al, Cu, Ti, Cr, Ni, Mo, Ta, W
- Alloys: Binary and multi-component alloys with controlled composition like Al-Si, Al-Cu, Ti-Al, Ni-Cr (custom compositions available)
- Ceramics & Compunds: Oxides, nitrides, carbides, and functional ceramics like ITO, Al₂O₃, TiN, Si, SiO₂
Compatible with DC, RF, and pulsed-DC magnetron sputtering systems.
Typical Technical Specifications
| Parameter | Specification |
| Purity | 99.9% – 99.999% (3N–5N) |
| Density | ≥ 99.5% of theoretical |
| Electrical Resistivity | Material-specific (e.g. Al ~2.7 µΩ·cm, Cu ~1.7 µΩ·cm) |
| Bonding Type | Indium bonded / Elastomer bonded / Unbonded |
| Target Forms | Circular, Rectangular, Custom |
| Backing Plates | Cu / Al / SS (as required) |
Specifications vary by material and target geometry.
Typical Technical Specifications
- Semiconductor metallization & barrier layers
- LCD / OLED display manufacturing
- Thin-film photovoltaic modules
- Optical & functional coatings
- Research labs and pilot production lines
